Share  

Photoresist    

Msds, Application,Process, Patents, Company Profiles,Report,Products,Effects,Market,Consultants,technology,Analysis,Study,Suppliers 

Primary Information Services

Home. Ordering Information. Contact

 

 

Information @ a Glance

  • A photoresist is a light-sensitive material used in several industrial processes, such as  photolithography and photoengraving to form a patterned coating on a surface.
  • Photoresists are classified into two groups: positive resists and negative resists.
  • A positive resist is a type of photoresist in which the portion of the photoresist that is exposed to light becomes soluble to the photoresist developer. The portion of the photoresist that is unexposed remains insoluble to the photoresist developer.
  • Positive resist has the advantages of high contrast, good step coverage, and high aspect ratios.
  • A negative resist is a type of photoresist in which the portion of the photoresist that is exposed to light becomes insoluble to the photoresist developer. The unexposed portion of the photoresist is dissolved by the photoresist developer.
  • Photoresists are photosensitive materials which after photoimaging and subsequent processing, resist action of certain chemicals in desired areas.
  • AZ® 9200 thick film photoresist is designed for the more demanding higher-resolution thick resist require-ments. It provides high resolution with superior aspect ratios, as well as wide focus and exposure latitude and good sidewall profiles.
  • Lithography is an old art. The dictionary starts by saying that it is the art of drawing pictures on a stone usually covered with a greasy substance. After the picture was drawn in the “grease” exposing the underlying stone, the exposed area could be etched with acid to form a groove. This held ink that could be transferred to paper.
  • Similar technology was used for etchings based on metal plates. The image was hand drawn before the acid etch was carried out. In the 1930s Kodak introduced a photosensitive material that could be coated on a metal plate to form an image upon exposure to visible light. The exposed regions became insoluble and the unexposed areas could be removed with an organic solvent. The material was called a Photoresist.
  • Photoresist materials are used in several industrial processes, such as photolithography and photoengraving to form a patterned coating on a surface.
  • A novel technique of photoresist coating, Dynamic Surface Tension (DST) coating, is presented.  This technique is particularly well suited for surfaces with pre-existing topography, which is often the case in micro-electro-mechanical systems (MEMS) and integrated circuits packaging.
  • Promising results are obtained using a commercial photoresist Shipley SPR 220-3.0
  • MEMS fabrication process of devices, there are three main
    different photoresist coating techniques: spin coating,
    electrodeposition (ED) coating, and spray coating.
  • Photoresists are typically three component systems made up of a phenolic novolak resin, a photoactive diazoquinone ester and a solvent.

Entrepreneur who want the information such as "Msds, Application,Process, Patents, Company Profiles, Report, Products, Effects, Market, Consultants, technology, Analysis, Study, Suppliers  " about  Photoresist  can email us to informer@eth.net, primaryinfo@gmail.com

Primary Information Services
 21 Murugappan St, SwamyNagar Ext2, 
Ullagaram, Chennai - 600091, India.
 Phone: 91 44 22421080 
Email : informer@eth.net,
primaryinfo@gmail.com
Mobile numbers:9940043898, 9444008898  Fax : 91 44 22423753